Facilities of the group Surface Photonics.

Nanofabrication and characterization
The most advanced nanofabrication and characterization techniques are available at Philips Research. We have full access to these facilities. These techniques include photolithography, e-beam lithography, focus-ion beam, reactive-ion etching, metal evaporation and sputtering, scanning and transmission electron microscopy, atomic force microscopy, energy dispersion spectroscopy, etc.

Nanophotonics
We have an advanced nanophotonic laboratory consisting of several setups: a microscope for micro-photoluminescence, a confocal microscope with a scanning head for fluorescence life time imaging and dark-field imaging, a set of rotation stages for angular dependent measurements of the transmission, reflection and luminescence, an integrating sphere for efficiency measurements, an streak camera for spectral and temporal resolved luminescence measurements. These setup are used in combination with several lasers: diode lasers, ion lasers and mode-locked lasers, and detectors: high efficiency CCD cameras, photon-multipliers, avalanche photo-detectors.