Silicon with very deep nanopores moulds flow of light

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AMOLF-researchers and researchers of the MESA+ Institute for Nanotechnology of the University Twente and ASML have developed a new method for creating nanopores in silicon. They have succeeded in making record-deep nano pores. These new structures can be used in chemical sensors, as condensators in high-frequency electronics and they appear to be powerful photonic crystals that mould the flow of light. Since the developed method is compatible with the technique that is already being used in the semiconductor industry, integration of the new structures in silicon chips is possible. On April 9th, the researchers published their results in the leading British journal Nanotechnology.

FOM press release (in Dutch)

Nanotechnology 19 (2008) 145304 1-11 (pdf)

(May 2008)