Name :Jan Verhoeven
Email :J.VerhoevenATamolf.nl
Group :Photonic materials
Group :Extreme-Ultraviolet (XUV) Physics
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Publications for J. Verhoeven


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Article(s) published in 2010

S. Dobrovolskiy, A.E. Yakshin, F.D. Tichelaar, J. Verhoeven, E. Louis and F. Bijkerk, Formation of Si/SiC multilayers by low-energy ion implantation and thermal annealing, Nucl. Instrum. Methods Phys. Res., Sect. B 268, 560–567 (2010).

Article(s) published in 2008

M. Kuttge, E.J.R. Vesseur, J. Verhoeven, H.J. Lezec, H.A. Atwater and A. Polman, Loss mechanisms of surface plasmon polaritons on gold probed by cathodoluminescence imaging spectroscopy, Appl. Phys. Lett. 93, 113110 1--3 (2008).
P. Johnsson, W. Siu, A. Gijsbertsen, J. Verhoeven, A.S. Meijer, W.J. van der Zande and M.J.J. Vrakking, Velocity map imaging of atomic and molecular processes at the free electron laser in Hamburg (FLASH), Journal of Modern Optics 55, 2693--2709 (2008).

Article(s) published in 2007

E.M. Sarkisyan, Z.S. Gevorkian, K.B. Oganesyan, V.V. Harutyunyan, V.A. Saakyan, S.G. Gevorgyan, J. Verhoeven, M.V. Fedorov, A.I. Artemiev and S.M. Fedorov, Resonant diffusive radiation in random multilayered systems, Laser Physics 17, 1080--1084 (2007).

Article(s) published in 2006

M.J.H. Kessels, J. Verhoeven, F.D. Tichelaar and F. Bijkerk, Si adhesion interlayer effects in hydrogen passivated Si/W soft X-ray multilayer mirrors, Surface Science 600, 1405--1408 (2006).
L.G.A.M. Alink, R.W.E. van de Kruijs, E. Louis, F. Bijkerk and J. Verhoeven, Improved temperature stability of Mo/Si multilayers by carbide based diffusion barriers through implantation of low energy CHx+ ions, Thin Solid Films 510, 26--31 (2006).
Z.S. Gevorkian and J. Verhoeven, Resonant diffusive radiation in random multilayered systems, Nuclear Instruments and Methods in Physics Research B 252, 57--61 (2006).

Article(s) published in 2005

M.J.H. Kessels, F. Bijkerk, F.D. Tichelaar and J. Verhoeven, Determination of in-depth density profiles of multilayer structures, Journal of Applied Physics 97, 093513 1--8 (2005).
M.J.H. Kessels, J. Verhoeven, F.D. Tichelaar and F. Bijkerk, Ion-induced interface layer formation in W/Si and WRe/Si multilayers, Surface Science 582, 227--234 (2005).
S. Dobrovolskiy, A.E. Yakshin, M.J.H. Kessels and J. Verhoeven, The application of energetic CHx+ ions to form a Si/SiC multilayer systems for reflection of radiation between 20 and 80 nm, Nuclear Instruments and Methods in Physics Research B 237, 533--542 (2005).

Article(s) published in 2004

H. Mertens, J. Verhoeven, A. Polman and F.D. Tichelaar, Infrared surface plasmons in two-dimensional silver nanoparticle arrays in silicon, Appl. Phys. Lett. 85, 1317--1319 (2004).
W. Knulst, J. Luiten and J. Verhoeven, Compact, high-brightness soft x-ray Cherenkov sources, IEEE J. Sel. Top. Quantum Electron. 10, 1414--1425 (2004).
M.J.H. Kessels, J. Verhoeven, A.E. Yakshin, F.D. Tichelaar and F. Bijkerk, Ion beam induced intermixing of interface structures in W/Si multilayers, Nuclear Instruments and Methods in Physics Research B 222, 484--490 (2004).

Article(s) published in 2003

W. Knulst, M.J. van der Wiel, O.J. Luiten and J. Verhoeven, High-brightness, narrowband, and compact soft x-ray Cherenkov sources in the water window, Appl. Phys. Lett. 83, 4050--4052 (2003).
H.J. Hopman, H.P. Alberda, I. Attema, H. Zeijlemaker and J. Verhoeven, Measuring the secondary electron emission characteristic of insulators, Journal of Electron Spectroscopy and Related Phenomena 131-132, 51--60 (2003).

Article(s) published in 2002

M.J.J. Jak, A. van Kreuningen, J. Verhoeven and J.W.M. Frenken, The effect of stoichiometry on the stability of steps on TiO2(110), Appl Surf. Sci. 201, 161--170 (2002).
J. Verhoeven, Layer growth at the nano-scale, Vacuum 65, 231--234 (2002).
Y.P. Pershin, Y.N. Zubarev, V.V. Kondratenko, O.V. Pol'tseva, A.G. Ponomarenko, V.A. Sevryukova and J. Verhoeven, Features of formation of Ni/C multilayer X-ray mirrors manufactured by electron-beam vaporization completed with an ion-beam etching, Metallofizika i Noveishie Tekhnologii 24, 795--814 (2002).

Article(s) published in 2001

H.J. Hopman, H. Zeijlemaker and J. Verhoeven, Secondary electron emission data of cesiated oxygen free high conductivity copper, II, Appl Surf. Sci. 171, 197--206 (2001).
W. Knulst, O.J. Luiten, M.J. van der Wiel and J. Verhoeven, Observation of narrow-band Si L-edge Cerenkov radiation generated by 5 MeV electrons, Appl. Phys. Lett. 79, 2999--3001 (2001).
M.J.J. Jak, C. Konstapel, A. van Kreuningen, J. Chrost, J. Verhoeven and J.W.M. Frenken, The influence of substrate defects on the growth rate of palladium nanoparticles on a TiO2(110) surface, Surface Science 474, 28--36 (2001).
M.J.J. Jak, C. Konstapel, A. van Kreuningen, J. Verhoeven, R. van Gastel and J.W.M. Frenken, Automated detection of particles, clusters and islands in scanning probe microscopy images, Surface Science 494, 43--52 (2001).

Article(s) published in 2000

H.J. Hopman, J. Verhoeven and P.K. Bachmann, Electron stimulated desorption from oxygenated and hydrogenated synthetic diamond films, Diamond Relat. Mater. 9, 1238--1244 (2000).
B. Lastdrager, A. Tip and J. Verhoeven, Theory of Cerenkov and transition radiation from layered structures, Physical Review E 61, 5767--5778 (2000).
M.J.J. Jak, C. Konstapel, A. van Kreuningen, J. Verhoeven and J.W.M. Frenken, Scanning tunnelling microscopy study of the growth of small palladium particles on TiO2(110), Surface Science 457, 295--310 (2000).

Article(s) published in 1999

H.J. Hopman and J. Verhoeven, Secondary electron emission data of cesiated oxygen free high conductivity copper, Appl Surf. Sci. 150, 1-7 (1999).
H.J. Hopman, J. Verhoeven, P.K. Bachmann, H. Wilson and R. Kroon, Secondary electron emission measurements on synthetic diamond films, Diamond Relat. Mater. 8, 1033-1038 (1999).
M.J.J. Jak, A. van Kreuningen, J. Chrost, J. Verhoeven, C. Konstapel and J.W.M. Frenken, Thermische veroudering: Thermische veroudering van een modelkatalysator, "gezien" met scanning tunneling microscopie, Nevacblad 37, 67-72 (1999).

Article(s) published in 1998

K. van Dijk, C.H.M. Mar, J. Verhoeven, F.H.P.M. Habraken and J.A. Jansen, A complete characterization of Ca5(PO4)3OH sputter-deposited films by ion beam analysis: RBS and ERD, Journal of Biomedical Materials Research 42, 266-271 (1998).

Article(s) published in 1997

H.J. Hopman, J. Verhoeven, J.J. Scholtz and R. Fastenau, Time variation of secondary electron emission during electron bombardment of rutile, Appl. Surf. Sci. 111, 270-275 (1997).
M. Cilia and J. Verhoeven, Ni/Si based multilayer for the reflection of soft x rays in the "water window", Journal of Applied Physics 82, 4137-4142 (1997).
K. van Dijk, J. Verhoeven, C.H.M. Mar, F.H.P.M. Habraken and J.A. Jansen, Study of the influence of oxygen on the composition of thin films obtained by r.f. sputtering from a Ca5(PO4)3OH target, Thin Solid Films 304, 191-195 (1997).

Article(s) published in 1996

R. Schlatmann, A. Keppel, Y. Xue, J. Verhoeven, C.H.M. Mar and F.H.P.M. Habraken, Enhanced x-ray optical contrast of Mo/Si multilayers by H implantation of Si, J. Appl. Phys. 80, 2121-2126 (1996).
R. Schlatmann, J.D. Shindler and J. Verhoeven, Evolution of surface morphology during growth and ion erosion of thin films, Physical Review B 54, 10880-10889 (1996).
P. van Loevezijn, R. Schlatmann, J. Verhoeven, B.A. van Tiggelen and E.M. Gullikson, Numerical and experimental study of disordered multilayers for broadband x-ray reflection, Appl. Opt. 35, 3614-3619 (1996).
R. Schlatmann, A. Keppel, S. Bultman, T. Weber and J. Verhoeven, Low energy ion beam mixing as a tool for multilayer x-ray mirror fabrication, Appl. Phys. Lett. 68, 2948-2950 (1996).

Article(s) published in 1995

T. Weber, J. Verhoeven, F.W. Saris and T. Osipowicz, Surface treatment by low energy metal ion irradiation, Nuclear Instruments & Methods in Physics Research B 106, 159-164 (1995).
K. van Dijk, H.G. Schaeken, C.H.M. Mar, J. Verhoeven, J.C.G. Wolke, F.H.P.M. Habraken and J.A. Jansen, Influence of Ar pressure on r.f. magnetron-sputtered Ca5(PO4)3OH layers, Surface and Coatings Technology 76-77, 206-210 (1995).
K. van Dijk, H.G. Schaeken, J.C.G. Wolke, C.H.M. Mar, F.H.P.M. Habraken, J. Verhoeven and J.A. Jansen, Influence of discharge power level on the properties of hydroxyapatite films deposited on Ti6A14V with RF magnetron sputtering, Journal of Biomedical Materials Research 29, 269-276 (1995).
R. Schlatmann, J.D. Shindler and J. Verhoeven, Diffuse-x-ray-scattering measurements of roughness on ion-etched multilayer interfaces, Phys. Rev. B 51, 5345-5351 (1995).

Article(s) published in 1994

R. Schlatmann, C. Lu, J. Verhoeven, E.J. Puik and M.J. van der Wiel, Modification by Ar and Kr ion bombardment of Mo/Si X-ray multilayers, Appl. Surf. Sci. 78, 147-157 (1994).
E. Louis, H.-J. Voorma, N.B. Koster, L. Shmaenok, F. Bijkerk, R. Schlatmann, J. Verhoeven, Y.Y. Platonov, G.E. van Dorssen and H.A. Padmore, Enhancement of reflectivity of multilayer mirrors for soft x-ray projection lithography by temperature optimization and ion bombardment, Microelectronic Engineering 23, 215-218 (1994).
J. Verhoeven, A. Keppel, R. Schlatmann, Y. Xue and I.V. Katardjiev, X-ray reflection, a technique for measuring sputtering yields of thin films, Nucl. Instrum. Methods Phys. Res. B 94, 395-403 (1994).
J.F. van der Veen and J. Verhoeven, Vacu, Natuur & Techniek 62, 348-359 (1994).

Article(s) published in 1993

R. Schlatmann, A. Keppel, Y. Xue, J. Verhoeven and M.J. van der Wiel, Enhanced reflectivity of soft x-ray multilayer mirrors by reduction of Si atomic density, Appl. Phys. Lett. 63, 3297-3299 (1993).

Article(s) published in 1992

J. Verhoeven, L. Chunguang, E.J. Puik, M.J. van der Wiel and T.P. Huijgen, Ion beam modification of Mo-Si multilayer systems for X-ray reflection, Appl. Surf. Sci. 55, 97-103 (1992).
E.J. Puik, M.J. van der Wiel, H. Zeijlemaker and J. Verhoeven, Ion bombardment of thin layers: the effect on the interface roughness and its x-ray reflectivity (invited), Rev. Sci. Instrum. 63, 1415-1419 (1992).

Article(s) published in 1991

E.J. Puik, M.J. van der Wiel, P. Lambooy, J. Verhoeven, F.E. Christensen and H.A. Padmore, Characterization of a multilayer coated laminar reflection grating at λ = 0.154 nm, J. X-Ray Sci. Technol. 3, 19-34 (1991).
E.J. Puik, G.E. van Dorssen, M.J. van der Wiel, J. Verhoeven, G. van der Laan and H.A. Padmore, Characterization of the resolving power of a double multilayer monochromator in the energy range of 600-900eV, J. Vac. Sci. Technol. A 9, 3142-3148 (1991).
E.J. Puik, M.J. van der Wiel, H. Zeijlemaker and J. Verhoeven, Ion etching of thin W layers: enhanced reflectivity of W-C multilayer coatings, Appl. Surf. Sci. 47, 63-76 (1991).
E.J. Puik, M.J. van der Wiel, H. Zeijlemaker and J. Verhoeven, Ion bombardment of X-ray multilayer coatings: comparison of ion etching and ion assisted deposition, Appl. Surf. Sci. 47, 251-260 (1991).
J. Verhoeven, How to obtain ultra high vacuum, the state of the art, Nauch. Apparat. 6, 165-179 (1991).

Article(s) published in 1990

E.J. Puik, M.J. van der Wiel, J. Verhoeven and H. Zeijlemaker, Ion-beam-assisted deposition of Ni/C multilayer X-ray mirrors, Thin Solid Films 193, 782-787 (1990).
J. Verhoeven, H. Zeijlemaker, E.J. Puik and M.J. van der Wiel, On the use of H+ and Ar+ ions for high spatial resolution depth profiling, Vacuum 41, 1327-1329 (1990).
J. Verhoeven, Meerlaags systemen voor de reflectie van zachte r, Nevacblad 28, 79-84 (1990).

Article(s) published in 1989

H. den Daas, H. Zeijlemaker, J. Verhoeven, E.J. Puik and M.J. van der Wiel, The interaction of nickel with a carbon surface at 20-280°C, J. Phys.: Condens. Matter 1, SB261-SB262 (1989).
J. Verhoeven, E.J. Puik and M.J. van der Wiel, Formation and characterization of multilayer coatings for X-ray optics, Vacuum 39, 711-716 (1989).

Article(s) published in 1988

H. van Brug, M.J. van der Wiel, R. van der Pol, J. Verhoeven, G. van der Laan and J.B. Goedkoop, Reflection extended x-ray absorption fine-structure measurement on Ni/C and NixSiy/C multilayered reflection coatings, J. Vac. Sci. Technol. A 6, 2182-2187 (1988).
E.J. Puik, M.J. van der Wiel, H. Zeijlemaker and J. Verhoeven, The role of layer growth on interface roughness in Ni-C multilayer X-ray mirrors, Vacuum 38, 707-709 (1988).

Article(s) published in 1987

H. van Brug, M.J. van der Wiel, M.P. Bruijn and J. Verhoeven, Summary Abstract: Extended x-ray absorption fine-structure features in the reflectivity of x-ray multilayers, J. Vac. Sci. Technol. A 5, 2028-2029 (1987).
M.P. Bruijn, J. Verhoeven, M.J. van der Wiel and W.J. Bartels, Improved resolution of multilayer x-ray coatings: a distributed Fabry-Perot etalon, Opt. Eng. 26, 679-684 (1987).
G. van der Laan, J.B. Goedkoop, J.C. Fuggle, M.P. Bruijn, J. Verhoeven, M.J. van der Wiel, A.A. MacDowell, J.A. West and I.H. Munro, Soft X-ray monochromatisation using a multilayer-single crystal combination, Nucl. Instrum. Methods Phys. Res. A 255, 592-597 (1987).

Article(s) published in 1986

M.P. Bruijn, J. Verhoeven, M.J. van der Wiel, G. van der Laan, J.B. Goedkoop, J.C. Fuggle and A.A. MacDowell, Characterization of multilayers as monochromators using 200-900 eV synchrotron radiation, Nucl. Instrum. Methods Phys. Res. A 253, 135-144 (1986).
M.P. Bruijn, P. Chakraborty, H.W. van Essen, J. Verhoeven and M.J. van der Wiel, Automatic electron-beam deposition of multilayer soft x-ray coatings with laterally graded d-spacing, Opt. Eng. 25, 916-921 (1986).

Article(s) published in 1985

M.P. Bruijn, H.G. Muller, J. Verhoeven and M.J. van der Wiel, Epitaxial growth of Si on GaP(100) and Si(111), monitored by soft X-ray reflection, Surface Science 154, 601-613 (1985).

Article(s) published in 1984

W.H. Wang and J. Verhoeven, Low energy electron impact effects on the adsorption of residual gases on a nickel (100) surface, Appl. Surf. Sci. 17, 331-336 (1984).
J. Verhoeven, W. Wen-Hoa and J.J. Czyzewski, The role of inner shell excitations in ESD of oxygen ions from a nickel oxide surface, Surf. Sci. 143, 31-36 (1984).
H.C. Gerritsen, M.P. Bruijn, J. Verhoeven and M.J. van der Wiel, Electron stimulated desorption of oxygen from nickel, Surf. Sci. 139, 16-28 (1984).
M.P. Bruijn, J. Verhoeven and M.J. van der Wiel, Optimization of multilayer soft X-ray mirrors, Nuclear Instruments & Methods in Physics Research 219, 603-606 (1984).

Article(s) published in 1982

J. Verhoeven, W.H. Wang and G.P.A. Frijlink, Energy consumption and the ability to obtain UHV using a Diffstak diffusion pump, Vacuum 32, 635-638 (1982).

Article(s) published in 1979

J. Verhoeven, Techniques to obtain atomically clean surfaces, J. Environ. Sci. 24-28 (1979).
J. Verhoeven and J.H. Los, The influence of an electron beam on the adsorption of CO and CO2 onto a Ni(110) surface, Surf. Sci. 82, 109-119 (1979).

Article(s) published in 1976

J. Verhoeven and G.P.A. Frijlink, Het schoonmaken van vacu, Ned. Tijdschr. Vacuumtech. 14, 52-56 (1976).
J. Verhoeven, Methoden tot het bereiken van ultra-hoog vacu, Nederlands Tijdschrift voor Natuurkunde 42, 44-47 (1976).

Article(s) published in 1975

J. Verhoeven, Techniques to obtain atomically clean surfaces, Ned. Tijdschr. Vacuumtech. 13, 55-59 (1975).

Article(s) published in 1974

Article(s) published in 1972

G.P.A. Frijlink and J. Verhoeven, Vergelijkend onderzoek van schoonmaakmethoden voor vacu, Ned. Tijdschr. Vacuumtech. 10, 85 (1972).
J. Verhoeven and E. Rieger, X-ray appearance potential measurements with a proportional counter, Ned. Tijdschr. Vacuumtech. 10, 80 (1972).